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Ultrananocrystalline diamond (UNCD) films have been deposited by microwave plasma chemical vapor deposition from 17% CH4/N2 mixtures. In order to change the original hydrogen termination of the UNCD surfaces, the films have subsequently been subjected either to the so-called UV/O3 treatment which leads to OH-terminated surfaces, or to NH3/N2 plasmas which introduces NH2 groups but also a certain amount of OH groups. These three types of surfaces have been characterized by X-ray photoelectron spectroscopy, contact angle and ζ-potential measurements. The contact angle measurements have shown that as-grown UNCD surfaces are highly hydrophobic but became highly hydrophilic after both treatments. The ζ-potential measurements revealed that the isoelectric point of the H-terminated as-grown surface is distinctively higher than that of either UV/O3 or NH3/N2 plasma treated surfaces. Finally, the interactions of these surfaces with neurons of the cockroach Leucophaea maderae have been investigated. These studies have shown that especially the two treated surfaces allow for a fast, strong attachment of these cells without compromising their viability and without changing their normal physiological responses. These results will be discussed in terms of those obtained with the different surface characterization techniques.