Search

Driven by applications like monitoring of combustion engines, toxic gases, nitrates in water, as well as the inactivation of multi-drug-resistant germs, the development of AlGaN-based light emitting diodes in the deep ultraviolet spectral range (DUV-LEDs) has markedly intensified. This paper will provide a review of recent advances in development of DUV-LEDs, including the realization of low defect density AlGaN heterostructures on sapphire substrates. The performance characteristics of DUV LEDs emitting in the wavelength range between 260 nm and 217 nm will be discussed and milli-Watt power LEDs near 233 nm will be demonstrated.

We will give an overview of the progress in ultraviolet-emitting vertical-cavity surface-emitting lasers (VCSELs) and their potential applications in areas such as disinfection and medical therapy. This includes our demonstration of the shortest wavelength VCSEL, emitting at 310 nm under optical pumping, and a detailed analysis of its filamentary lasing characteristics. The UVB-emitting AlGaN-based VCSEL was realized by substrate removal using electrochemical etching, enabling the use of two high-reflectivity dielectric distributed Bragg reflectors. The potential of using this or alternative methods to push the emission to shorter wavelengths will be examined as well as concepts to realize electrically injected devices.

We here demonstrate thin-film flip-chip (TFFC) ultraviolet-B light-emitting diodes (LEDs) fabricated by a standard LED process and followed by a substrate removal based on selective electrochemical etching of an n-doped multilayered Al0.11Ga0.89N/Al0.37Ga0.63N sacrificial layer. The integration of the LEDs to a Si carrier using thermocompression bonding allowed roughening of the N-polar AlGaN side of the TFFC LEDs using TMAH-etching, which increased the light extraction efficiency by approximately 45% without negatively affecting the I-V-characteristics. This resulted in an optical output power of 0.47 mW at 10 mA for an LED with a p-contact area of 0.03 mm2.