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1. Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy.

Author

Fainer, N., Plekhanov, A., and Asanov, I.

Subjects
*SILICON nitride films, *CHEMICAL bonds, *ELECTRIC properties of nanocomposite materials, *SYNTHESIS of Nanocomposite materials, *X-ray photoelectron spectroscopy, *ENERGY dispersive X-ray spectroscopy, *INFRARED spectroscopy
Abstract

The element composition and chemical bonds of nanocomposite films of hydrogenated silicon oxycarbonitride fabricated through high-frequency plasma-chemical deposition from initial gas mixtures of 1,1,3,3-tetramethyldisilazane with nitrogen and oxygen in the temperature range 373-973 K depending on the synthesis conditions is studied. The effect of changes in the temperature and chemical composition of the initial gas mixtures on the element composition and types of chemical bonds in SiCNO:H films is investigated. [ABSTRACT FROM AUTHOR]

Published
2017
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