1. Effect of Interface Layer Engineering on Resistive Switching Characteristics of ZrO2-Based Resistive Switching Devices.
- Author
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Li, Yingtao, Li, Xiaoyan, Fu, Liping, Chen, Rongbo, Wang, Hong, and Gao, Xiaoping
- Subjects
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NONVOLATILE random-access memory , *ANODES , *THIN films , *ELECTRODES , *RANDOM access memory - Abstract
An intentionally introduced interface layer in the resistive random-access memory (RRAM) devices play an important role in the improvement of resistive switching characteristics. In this paper, the resistive switching characteristics of ZrO2-based RRAM devices by inserting a thin TiO2 interface layer between electrodes and ZrO2 resistive switching layer were investigated. Compared with the Cu/ZrO2/Pt and Cu/ZrO2/TiO2/Pt devices, the Cu/TiO2/ZrO2/Pt and Cu/TiO2/ZrO2/TiO2/Pt devices showed much improved programing voltages, including lower forming voltage and lower set voltage. Moreover, the reset current was also improved. These results indicate that the TiO2 interface layer between the anode electrode and the resistive switching layer plays an important role in improving device performance. [ABSTRACT FROM AUTHOR]
- Published
- 2018
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