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A new 3-D vertical bipolar junction transistor (BJT) resistive-switching memory (ReRAM) cell with complimentary metal–oxide–semiconductor-compatible process has been demonstrated and characterized. A new logic-compatible BJT is vertically formed underneath the resistive stacked film of \TiN/Ti/HfO2\/\TiN as a high-performance current driver and bit-cell selector. Using a shallow and tiny N-type lightly doped drain to be an emitter connects with ReRAM film as the bitline, a very thin and self-aligned P-pocket implant layer to be the wordline, and the N-well is the collector of the cells. As a result, the new 3-D ReRAM cell is very area saving and efficiently operated by the high-gain (\beta > \50) BJT at a low voltage of 2 V for reset and 1.5 V for set. By adapting the highly shrinkable 3-D BJT current driver in ReRAM, the ReRAM is fully decoupled with the gate length and oxide thickness of logic metal–oxide–semiconductor field-effect transistors; furthermore, it can easily be scaled down to \4F^2 under the lithographic limitation of defining ReRAM film with \F^2 area. [ABSTRACT FROM PUBLISHER]