23 results on '"de Gendt, Stefan"'
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2. Study of the reliability impact of chlorine precursor residues in thin atomic-layer-deposited Hf[O.sub.2] layers
3. High-[kappa] metal gate MOSFETs: Impact of extrinsic process condition on the gate-stack quality--A mobility study
4. Estimation of fixed charge densities in hafnium-silicate gate dielectrics
5. Electrical and physical characterization of remote plasma oxidized Hf[O.sub.2] gate dielectrics
6. The Role of Nonidealities in the Scaling of MoS2 FETs
7. An Investigation on Border Traps in III–V MOSFETs With an In0.53Ga0.47As Channel
8. Energy Distribution of Positive Charges in Gate Dielectric: Probing Technique and Impacts of Different Defects
9. Interface States Beyond Band Gap and Their Impact on Charge Carrier Mobility in MOSFETs
10. New Developments in Charge Pumping Measurements on Thin Stacked Dielectrics
11. Effects of $\hbox{Al}_{2}\hbox{O}_{3}$ Dielectric Cap and Nitridation on Device Performance, Scalability, and Reliability for Advanced High- $\kappa$/Metal Gate pMOSFET Applications
12. Study of the Reliability Impact of Chlorine Precursor Residues in Thin Atomic-Layer-Deposited $\hbox{HfO}_{2}$ Layers
13. High-$\kappa$ Metal Gate MOSFETs: Impact of Extrinsic Process Condition on the Gate-Stack Quality—A Mobility Study
14. New Insights Into Defect Loss, Slowdown, and Device Lifetime Enhancement.
15. A Single Pulse Charge Pumping Technique for Fast Measurements of Interface States.
16. Determination of Work Functions in the Ta1-xA1xNy/HfO2 Advanced Gate Stack Using Combinatorial Methodology.
17. Stress-Induced Positive Charge in Hf-Based Gate Dielectrics: Impact on Device Performance and a Framework for the Defect.
18. Effects of Al2O3 Dielectric Cap and Nitridation on Device Performance, Scalability, and Reliability for Advanced High-k/Mëtal Gate pMOSFET Applications.
19. Study of the Reliability Impact of Chlorine Precursor Residues in Thin Atomic-Layer-Deposited HfO2 Layers.
20. High-κ Metal Gate MOSFETs: Impact of Extrinsic Process Condition on the Gate-Stack Quality—A Mobility Study.
21. Electrical Characteristics of 8-Å EOT Hf02/TaN Low Thermal-Budget n-Channel FETs With Solid-Phase Epitaxially Regrown Junctions.
22. Electrical and Physical Characterization of Remote Plasma Oxidized HfO2 Gate Dielectrics.
23. A Study of Relaxation Current in High-κ Dielectric Stacks.
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