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This article investigates the displacement damage on AlGaN/GaN high-electron-mobility transistors (HEMTs) using the 30-MeV fluorine ions. The electrical degradation and the defects in HEMTs were examined before and after irradiation. Three defect states are detected in a deep-level transient analysis system (DLTS), including a broad surface state peak ($N_{1}$) and two bulk defect peaks ($H_{1}$ and $H_{2}$). The energy levels of these two defects are $E_{\mathrm {C}} 0.63$ eV ($H_{2}$) and $E_{\mathrm {C}} 0.91$ eV ($H_{1}$), respectively. There is a linear relationship between the concentration of $H_{1}$ and the fluorine ion fluence. The radiation damage and electrical performance degradation of AlGaN/GaN HEMTs are simulated by combining with simulation software of different methods. The calculated results are in agreement with the experimental data. The performance degradation caused by heavy ion of the device is mainly caused by the $H_{1}$ defect. The effect of defects with shallow energy level is shielded by the Fermi-level pinning in deeper energy level. Moreover, the defect distribution of GaN in AlGaN/GaN heterojunction plays a major role. It is found that the method of combining experimental data with multiscale simulation is an effective way to predict the radiation damage of devices. [ABSTRACT FROM AUTHOR]

To explore the role of hydrogen in radiation degradation of AlGaN/GaN high-electron-mobility transistors (HEMTs), the performance degradation of the hydrogen untreated and pretreated devices is compared under the exposure of carbon ions. The energy of carbon ions is chosen as 7.6 MeV, and the maximum fluence reaches 4 × 1012 cm−2. By electrical character measuring, it is found that the positive shift of the threshold voltage and the decrease of the transconductance occur after to the irradiation. Hydrogen pretreatment accelerates the shift of threshold voltage and the decrease of the transconductance. The threshold voltage of the device is almost unchanged under 1-MeV electron irradiations. This means that the displacement damage leads to the shift of the threshold voltage. The height of Schottky barrier hardly changes in the hydrogen pretreated devices, showing that the ionization defects such as the formation of interface states under the gate are not the main cause of device degradation. Deep level transient spectrum (DLTS) results show that the irradiations cause the increase of gallium vacancies, and the hydrogen pretreatment inhibits its formation. According to the first principle calculation, the existence of hydrogen in GaN layer can reduce the formation energy of and the number of charges of the defects. It is speculated that hydrogen atoms participate in the evolution of radiation defects, which changes the types and number of defects in the devices. [ABSTRACT FROM AUTHOR]