1. Reflectance of Silicon Photomultipliers at Vacuum Ultraviolet Wavelengths
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Lv, P., primary, Cao, G. F., additional, Wen, L. J., additional, Kharusi, S. Al, additional, Anton, G., additional, Arnquist, I. J., additional, Badhrees, I., additional, Barbeau, P. S., additional, Beck, D., additional, Belov, V., additional, Bhatta, T., additional, Breur, P. A., additional, Brodsky, J. P., additional, Brown, E., additional, Brunner, T., additional, Mamahit, S. Byrne, additional, Caden, E., additional, Cao, L., additional, Chambers, C., additional, Chana, B., additional, Charlebois, S. A., additional, Chiu, M., additional, Cleveland, B., additional, Coon, M., additional, Craycraft, A., additional, Dalmasson, J., additional, Daniels, T., additional, Darroch, L., additional, St. Croix, A. De, additional, Mesrobian-Kabakian, A. Der, additional, Deslandes, K., additional, DeVoe, R., additional, Vacri, M. L. Di, additional, Dilling, J., additional, Ding, Y. Y., additional, Dolinski, M. J., additional, Doria, L., additional, Dragone, A., additional, Echevers, J., additional, Edaltafar, F., additional, Elbeltagi, M., additional, Fabris, L., additional, Fairbank, D., additional, Fairbank, W., additional, Farine, J., additional, Ferrara, S., additional, Feyzbakhsh, S., additional, Fucarino, A., additional, Gallina, G., additional, Gautam, P., additional, Giacomini, G., additional, Goeldi, D., additional, Gornea, R., additional, Gratta, G., additional, Hansen, E. V., additional, Heffner, M., additional, Hoppe, E. W., additional, Hobl, J., additional, House, A., additional, Hughes, M., additional, Iverson, A., additional, Jamil, A., additional, Jewell, M. J., additional, Jiang, X. S., additional, Karelin, A., additional, Kaufman, L. J., additional, Koffas, T., additional, Krucken, R., additional, Kuchenkov, A., additional, Kumar, K. S., additional, Lan, Y., additional, Larson, A., additional, Leach, K. G., additional, Lenardo, B. G., additional, Leonard, D. S., additional, Li, G., additional, Li, S., additional, Li, Z., additional, Licciardi, C., additional, MacLellan, R., additional, Massacret, N., additional, McElroy, T., additional, Medina-Peregrina, M., additional, Michel, T., additional, Mong, B., additional, Moore, D. C., additional, Murray, K., additional, Nakarmi, P., additional, Natzke, C. R., additional, Newby, R. J., additional, Ning, Z., additional, Njoya, O., additional, Nolet, F., additional, Nusair, O., additional, Odgers, K., additional, Odian, A., additional, Oriunno, M., additional, Orrell, J. L., additional, Ortega, G. S., additional, Ostrovskiy, I., additional, Overman, C. T., additional, Parent, S., additional, Piepke, A., additional, Pocar, A., additional, Pratte, J. -F., additional, Radeka, V., additional, Raguzin, E., additional, Rescia, S., additional, Retiere, F., additional, Richman, M., additional, Robinson, A., additional, Rossignol, T., additional, Rowson, P. C., additional, Roy, N., additional, Runge, J., additional, Saldanha, R., additional, Sangiorgio, S., additional, Skarpaas, K., additional, Soma, A. K., additional, St-Hilaire, G., additional, Stekhanov, V., additional, Stiegler, T., additional, Sun, X. L., additional, Tarka, M., additional, Todd, J., additional, Totev, T. I., additional, Tsang, R., additional, Tsang, T., additional, Vachon, F., additional, Veeraraghavan, V., additional, Viel, S., additional, Visser, G., additional, Vivo-Vilches, C., additional, Vuilleumier, J.-L., additional, Wagenpfeil, M., additional, Wager, T., additional, Walent, M., additional, Wang, Q., additional, Watkins, J., additional, Wei, W., additional, Wichoski, U., additional, Wu, S. X., additional, Wu, W. H., additional, Wu, X., additional, Xia, Q., additional, Yang, H., additional, Yang, L., additional, Zeldovich, O., additional, Zhao, J., additional, Zhou, Y., additional, and Ziegler, T., additional
- Published
- 2020
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