1. Analysis of near-field light intensity
- Author
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Zhen Jin, Keyi Wang, and Wenhao Huang
- Subjects
Diffraction ,Physics ,Light intensity ,Optics ,business.industry ,Optical engineering ,Near-field optics ,Plane wave ,Light beam ,Near-field scanning optical microscope ,Near and far field ,business - Abstract
In this paper a numerical simulation is used to calculate near-field intensity by `split light beam.' The calculation proves to be valid as we apply it to the plane wave. In the case of one dimension structure such as a compact disk sample, the near-field intensity profiles show a rather complicated structure. In many cases the near-field intensity does not represent the actual surface profile. The near-field intensity is strongly modulated by the surface structure. When the distance between the sample and the probe becomes larger, some subtle perturbation is added to the intensity profile, and a shift between the surface and the intensity profile became more clear. The shift may cause some problems when we use the optical probe as a multi- function probe to do some lithograph work or to position. In this paper, a comparison between the calculation and experiment results was made.© (1996) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
- Published
- 1996
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