Author: "Xiewen Wang" / Journal: international electron devices meeting 1999 technical digest (cat no99ch36318) - Searchworks@Jio Institute Digital Library Search Results

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Start Over Author "Xiewen Wang" Journal international electron devices meeting 1999 technical digest (cat no99ch36318)

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1. High quality ultra-thin (1.5 nm) TiO/sub 2/-Si/sub 3/N/sub 4/ gate dielectric for deep sub-micron CMOS technology.

Author: Xin Guo, Xiewen Wang, Zhijiong Luo, Ma, T.P., and Tamagawa, T.
Published: 1999
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