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The large area LPCVD Si3N4 membrane mounted with NiCr/Ni thermocouples is the key structure which is used not only in the study on the micrometer scale thermal and material science research, but also in the applications such as the mass flow sensors of gas and liquid. Normaly the successful fabrication of this device is difficult. By a steped-upward chemical etch method that we have developed, we have fabricated a suspended large area (3mm × 6mm) Si3N4 membrane which is mounted with NiCr/Ni thermocouples. The thickness of membrane is from l00nm to l000nm. [ABSTRACT FROM AUTHOR]