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Pure indium metal was thermally evaporated in the presence of oxygen atmosphere, with partial pressure of 6.6x10[?]2 Pa, onto glass substrates and onto C-Cu grid at room temperature. The structural characteristics of these optically transparent and electrically conducting thin films were investigated using X-ray diffraction (XRD) and transmission electron microscopy (TEM) techniques and the results are discussed on the base of the differences in their morphologies and thicknesses. Cubic In2O3 and tetragonal In phases, with crystal structures and lattice parameters as reported in the literature, have been identified in the thinnest film having 100 nm thickness. The tendency for amorphization of the cubic and tetragonal phases becomes evident as the film thickness increases.