1. Segregation control for ultrathin Ge layer in Al/Ge(111) system
- Author
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Noriyuki Taoka, Katsunori Makihara, Seiichi Miyazaki, Masato Kobayashi, Mitsuhisa Ikeda, and Akio Ohta
- Subjects
Materials science ,Physics and Astronomy (miscellaneous) ,Chemical bond ,Air exposure ,X-ray photoelectron spectroscopy ,General Engineering ,Analytical chemistry ,General Physics and Astronomy ,Layer (electronics) - Abstract
An impact of the vacuum anneal of Al/Ge(111) structure on the Ge segregation has been investigated to get an insight into the precise control of ultrathin Ge crystalline growth. The Al/Ge(111) structure was prepared by thermal evaporation of Al on wet-cleaned Ge(111) and then vacuum annealed without air exposure to promote Ge formation on the Al surface. The Ge formation and its chemical bonding features were evaluated by X-ray photoelectron spectroscopy analysis. In addition, changes in the average Ge thickness depending on annealing temperature and time were crudely estimated. We found that the annealing temperature had a greater effect than time on the control of sub-nanometer scale Ge growth.
- Published
- 2021
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