9 results on '"Muroya, Yusa"'
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2. Reaction mechanisms of Sn-complex-side-chain polymer used for extreme ultraviolet lithography, studied by electron pulse radiolysis and γ-radiolysis
3. Sensitization mechanism of metal oxide nanocluster resists with carboxylic acid ligands
4. Decarboxylation efficiency of carboxylic acids as ligands of metal oxide nanocluster resists upon γ-ray irradiation
5. Study on radical dianions of carboxylates used as ligands of metal oxide nanocluster resists
6. Pulse radiolysis of carboxylic acids used as ligands of metal oxide nanocluster resists
7. Pulse radiolysis of methacrylic acid ligand for zirconia nanoparticle resist
8. Dependence of relationship between chemical gradient and line width roughness of zirconia nanoparticle resist on pattern duty, acid generator, and developer
9. Development of Ultra-Fast Semiconducting Scintillators Using Quantum Confinement Effect
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