1. Time-Lapse Observation of Electrolysis of Copper Sulfate with a Full-Field X-ray Fluorescence Imaging Microscope
- Author
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Hiroki Yokosuka, Tatsuya Aota, Norio Watanabe, Sadao Aoki, Takuji Ohigashi, and Hidekazu Takano
- Subjects
Detection limit ,Electrolysis ,Microscope ,Physics and Astronomy (miscellaneous) ,General Engineering ,Analytical chemistry ,General Physics and Astronomy ,X-ray fluorescence ,chemistry.chemical_element ,Copper ,Fluorescence ,Cathode ,law.invention ,chemistry ,law ,Deposition (law) - Abstract
The time-lapse observation of the electrodeposition of copper in copper sulfate solution was performed by imaging X-ray fluorescence from the copper deposition. The X-ray fluorescence was directly imaged with a full-field Wolter mirror microscope, which was constructed at the Photon Factory. Controlling the electric current in the solution from 0 to 71.7 µA, the deposition of copper on a Pt cathode was directly observed by imaging its X-ray fluorescence. One exposure time for obtaining an X-ray fluorescence image was 80 s. Then, it was 17 min later from the beginning of the electrolysis when the X-ray fluorescence image of the electrodeposition is observed for the first time. At this exposure time, the detection limit of the mass of copper was estimated to be 0.60 pg/image, which was calculated using test samples of 1.00×10-3–1.00 mol/l copper sulfate solutions.
- Published
- 2008
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