1. X-ray photoelectron spectroscopy study of highly-doped ZnO:Al,N films grown at O-rich conditions.
- Author
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Ievtushenko, A., Khyzhun, O., Shtepliuk, I., Bykov, O., Olifan, O., Lashkarev, G., Jakieła, R., Tkach, S., Kuzmenko, E., Baturin, V., and Karpenko, О.
- Subjects
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X-ray photoelectron spectroscopy , *ZINC oxide films , *ULTRAVIOLET detectors , *X-ray emission spectroscopy , *SECONDARY ion mass spectrometry - Abstract
Highly-doped ZnO:Al,N films were grown under oxygen-rich conditions on Si substrates by magnetron sputtering using a layer-by-layer growth technique. An investigation of the highly-doped ZnO:Al,N films is attractive for obtaining p -type conductivity in ZnO films as well as for an improvement of performance of ZnO-based ultraviolet (UV) detectors. X-ray diffraction, scanning electron microscopy, energy dispersive X-ray analysis (EDX), X-ray photoelectron spectroscopy (XPS), X-ray emission spectroscopy (XES) and Secondary ion mass spectrometry (SIMS) were used for the samples characterization. An effect of high Al and N doping on structure and electronic properties of ZnO films was studied and discussed. [ABSTRACT FROM AUTHOR]
- Published
- 2017
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