1. Laser assembly of CeO2 nanobrushes and their resistive switching performance.
- Author
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Wu, Ling, Ran, Lei, Lv, Yifeng, Wang, Tingbin, Zhang, Shuowen, Tofil, Szymon, Fan, Lisha, and Yao, Jianhua
- Subjects
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CERIUM oxides , *PULSED lasers , *MEMRISTORS , *LASER pulses , *RF values (Chromatography) - Abstract
Memristors in a metal/oxide/metal configuration emerge as an advanced non-volatile information storage technology due to their high operating speed and low power consumption. Understanding the role of the microstructure of the active oxide layer in its resistive switching (RS) performance is scientifically important for revealing the conduction mechanism of oxides, and technically critical for the development of high-performance memristors. Here, self-assembly of vertically aligned CeO 2 nanobrushes, a typical RS material, is demonstrated in pulsed laser epitaxy. The growth map of CeO 2 is fully explored, and optimized growth conditions for CeO 2 nanobrushes are established. Microstructure and crystallinity characterizations reveal the single-crystalline epitaxy nature of CeO 2 nanobrushes. A nanobrush memristor exhibits a threshold switching feature with an On/Off ratio of 50, as 16 times high as a thin-film memristor, and excellent endurance of up to 500 cycles and retention time of up to 104 seconds. Theoretical fitting of the I-V curves of the thin-film and nanobrush memristors show interfacial switching in the thin-film memristor and filamentary switching in the nanobrush memristor. The distinct RS mechanisms between thin films and nanobrushes suggest the fundamental role of the structural design of active oxide layers in the RS performance of oxide-based memristors. • Vertical self-assembly of CeO 2 nanobrushes was achieved using pulse laser epitaxy, with full exploration of the growth map and optimization of growth conditions. • A nanobrush memristor exhibits threshold switching characteristics with a high On/Off ratio of 50 and a retention time of up to 104 seconds. • CeO 2 nanobrush memristors exhibit filamentary threshold switching compared to thin-film memristors, highlighting the role of structural design in conductive filament formation. • The CeO 2 nanobrushes, with their ∼15 nm diameter, vertical alignment, and low threshold filamentary switching, are promising as selectors for cross-switching memory architectures, effectively suppressing interference. [ABSTRACT FROM AUTHOR]
- Published
- 2024
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