1. Suppression of inelastic deformation of nanocoated thin film microstructures
- Author
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Martin L. Dunn, Yanhang Zhang, Ken Gall, Steven M. George, and Jeffrey W. Elam
- Subjects
Surface micromachining ,Atomic layer deposition ,Materials science ,Vacuum deposition ,Metallurgy ,Stress relaxation ,General Physics and Astronomy ,Chemical vapor deposition ,Composite material ,Thin film ,Layer (electronics) ,Amorphous solid - Abstract
We study the suppression of time-dependent inelastic deformation due to creep, stress relaxation, and microstructural evolution in multilayer thin film microstructures by the use of alumina nanocoatings realized by atomic layer deposition (ALD). Gold (0.5 μm thick)/polysilicon (1.5 or 3.5 μm thick) beam and plate microstructures were fabricated using surface micromachining. The microstructures were then coated on each side with a 40-nm-thick amorphous Al2O3 layer by ALD. The beam and plate microstructures were initially thermal cycled between room temperature and 190 °C to partially stabilize the gold microstructure. After the initial thermal cycles, the microstructures were cooled from 190 to 120 °C and held at 120 °C for about 700 h (4 weeks). We measured, using an interferometric microscope with a custom-built temperature chamber, full-field deformed shapes (and from these determined the average curvatures in the x and y directions) of the microstructures during the initial thermal cycles, during the c...
- Published
- 2004
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