1. Effect of oxygen vacancies and strain on the phonon spectrum of HfO2 thin films.
- Author
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Lingyuan Gao, Yalon, Eilam, Chew, Annabel R., Deshmukh, Sanchit, Salleo, Alberto, Pop, Eric, and Demkov, Alexander A.
- Subjects
HAFNIUM oxide films ,OXYGEN reduction ,RAMAN spectra ,FIELD-effect transistors ,PHONON spectra - Abstract
The effect of strain and oxygen deficiency on the Raman spectrum of monoclinic HfO
2 is investigated theoretically using first-principles calculations. 1% in-plane compressive strain applied to a and c axes is found to blue shift the phonon frequencies, while 1% tensile strain does the opposite. The simulations are compared, and good agreement is found with the experimental results of Raman frequencies greater than 110 cm-1 for 50 nm HfO2 thin films. Several Raman modes measured below 110 cm-1 and previously assigned to HfO2 are found to be rotational modes of gases present in air ambient (nitrogen and oxygen). However, localized vibrational modes introduced by threefold-coordinated oxygen (O3 ) vacancies are identified at 96.4 cm-1 computationally. These results are important for a deeper understanding of vibrational modes in HfO2 , which has technological applications in transistors and particularly in resistive random-access memory whose operation relies on oxygen-deficient HfOx . [ABSTRACT FROM AUTHOR]- Published
- 2017
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