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Ultrathin amorphous SiO2 films are radio frequency sputter deposited onto thin film gold electrodes and incorporated as the insulating barrier in metal/insulator/metal tunnel junctions of the type Au/SiO2/Pb. Inelastic electron tunneling spectra (IETS) recorded at 4.2 K reveal characteristic zero bias anomalies associated with rapid variations in the Pb density of states on either side of the superconducting gap which shows unequivocally that tunneling is the primary conduction mechanism through the junctions at this temperature. Full IET spectra reported are essentially identical to those previously recorded for similar SiO2 films on aluminum. Atomic force and scanning tunneling microscope images of the SiO2 and underlying gold films are also presented; these data confirm that the SiO2 films are sufficiently uniform and continuous for IETS.

Inelastic electron tunneling spectroscopy (IETS) is used to record the vibrational spectra of thin films of amorphous SiOx prepared by radio‐frequency planar magnetron sputter deposition in argon. The SiOx films are incorporated as the insulating barriers in aluminium SiOx/lead tunnel junctions, with no prior or subsequent oxidation of the aluminium films. Peak assignments are presented by comparison with infrared, Raman, and neutron scattering data for bulk silica, and a plausible stoichiometry is proposed. The SiOx barriers can be considered as model glass substrates for further adsorption studies, and hence extend the analytical capabilities of IETS.