Search

Abstract: In this work, we systematically investigate the effects of growth parameters on the structural and surface morphological properties of β-(AlxGa1−x)2O3thin films grown on (010) β-Ga2O3substrates via metalorganic chemical vapor deposition (MOCVD). By varying [TMAl]/[TEGa + TMAl] molar flow rate ratio, growth temperature and chamber pressure, (i) the structural and physical properties of β-(AlxGa1−x)2O3films including Al incorporations, growth rates, strain properties, rocking curve full width at half maximum, and (ii) the surface morphological properties are investigated. Higher [TMAl]/[TEGa + TMAl] molar flow ratio leads to higher Al incorporation in β-(AlxGa1−x)2O3films. Higher growth temperature promotes lower growth rates with substantial surface roughening, although the Al incorporation remains similar for a given [TMAl]/[TEGa + TMAl] molar flow ratio. In addition, increasing chamber pressure leads to lower growth rates and lower Al incorporation in the AlGaO films. This study reveals that the MOCVD growth window for (010) β-(AlxGa1−x)2O3films becomes narrower as the Al composition increases. Graphic abstract: