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Flexoelectric and photo-flexoelectricity are scientifically intriguing and hold considerable potential for various applications such as soft strain sensing, photovoltaics, energy harvesting, etc. Among flexoelectric materials, freestanding ferroelectric thin films are believed to have huge flexoelectricity and tunability due to their excellent lattice regulatory freedom and sustainability to larger strain gradients. In this work, we demonstrated a freestanding BiFeO3(BFO) thin film-based soft strain sensor and explored their flexoelectric coefficient and flexoelectric photovoltaic effect under different strain gradients. Under different bending scales, the photocurrent of the thin film exhibits a step-like variation, indicating that the sensor can measure strain gradient with high sensitivity. These results show the potential application of freestanding ferroelectric films in flexible devices.

The controllable manipulation of polar topological structures (e.g. skyrmion bubble) in ferroelectric materials have been considered as a cornerstone for future programmable nano-electronics. Here, we present the effective creation and erasure of polar bubble states PbTiO3 (PTO) multilayers trigged by mechanical stress and light illumination, respectively. It was found that applying atomic force microscope (AFM) tip force can induced formation of nanoscale bubble domains from the initial monodomain state. Moreover, the created bubble domain can be eliminated by exposure to ultraviolet or infrared light illumination. The above results can be understood by modulation of depolarization screening charges and bias fields, as reflected by scanning Kelvin potential microscopic (SKPM) observations, whereby the flexoelectric effect from the tip force tends to remove the screening charges on top surface and modulate the bias field that favors the formation of bubble state while light illumination tends to recover the screen charges and favor the monodomain state. The results provide a good example for multi-field manipulation of polar topologies, which might create a new avenue towards the immerging new concept electronic devices.

Recently, there is a surge of research interest in configurable ferroelectric conductive domain walls which have been considered as possible fundamental building blocks for future electronic devices. In this work, by using piezoresponse force microscopy and conductive atomic force microscopy, we demonstrated the controlled manipulation of various conductive domain walls in epitaxial BiFeO3 thin films, e.g. neutral domain walls (NDW) and charged domain walls (CDWs). More interestingly, a specific type of nanoscale domains was also identified, which are surrounded by highly conductive circular CWDs. Similar nanoscale domains can also be controlled created and erasured by applying local field via conductive probe, which allow nondestructive current readout of different domain states with a large on/off resistance ratio up to 102. The results indicate the potential to design and develop high-density non-volatile ferroelectric memories by utilizing these programable conductive nanoscale domain walls.

As a high-k material, hafnium oxide (HfO2) has been used in gate dielectrics for decades. Since the discovery of polar phase in Si-doped HfO2 films, chemical doping has been widely demonstrated as an effective approach to stabilize the ferroelectric phase in HfO2 based thin films. However, the extra capping layer deposition, post-growth annealing and wake-up effect are usually required to arouse the ferroelectricity in HfO2 based thin films, resulting in the increase of complexity for sample synthesis and the impediment of device application. In this study, the ferroelectricity is observed in non-capped dopant-free HfO2 thin films prepared by pulsed laser deposition (PLD) without post-growth annealing. By adjusting the deposited temperature, oxygen pressure and thickness, the maximum polarization up to 14.7 μC/cm2 was obtained in 7.4 nm-thick film. The fraction of orthorhombic phase, concentrations of defects and size effects are considered as possible mechanisms for the influences of ferroelectric properties. This study indicates that PLD is an effective technique to fabricate high-quality ferroelectric HfO2 thin films in the absence of chemical doping, capping layer deposition and post-growth annealing, which may boost the process of nonvolatile memory device application.

BiFeO3, a single-phase multiferroic material, possesses several polymorphs and exhibits a strong sensitivity to strain. Recently, emergent strain engineering in BiFeO3 thin films has attracted intense interest, which can overcome the confines of traditional strain engineering introduced through the mismatch between the film and substrate. In this review, we discuss emerging non-traditional strain engineering approaches to create new ground states and manipulate novel functionalities in multiferroic BiFeO3 thin films. Through fabricating freestanding thin films, inserting an interface layer or utilizing thermal expansion mismatch, continuously tunable strain can be imposed beyond substrate limitations. Nanostructured evolution and defect introduction are discussed as efficient routes to introduce strain, promising for the development of new nanodevices. Ultrafast optical excitation, growth conditions and chemical doping driven strain are summarized as well. We hope this review will arouse the readers’ interest in this fascinating field.