1. Dielectric breakdown in AlOx tunnelling barriers
- Author
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P F P Fichtner, Lucio Strazzabosco Dorneles, M. Carara, D. M. Schaefer, and L. F. Schelp
- Subjects
Acoustics and Ultrasonics ,Condensed matter physics ,Dielectric strength ,chemistry.chemical_element ,Dielectric ,Plasma ,Condensed Matter::Mesoscopic Systems and Quantum Hall Effect ,Condensed Matter Physics ,Surfaces, Coatings and Films ,Electronic, Optical and Magnetic Materials ,Tunnel effect ,chemistry ,Aluminium ,Condensed Matter::Superconductivity ,Electric field ,Electric potential ,Quantum tunnelling - Abstract
We studied the dielectric breakdown in tunnelling barriers produced by plasma-assisted oxidation of an aluminium surface. The barrier mean height, thickness and the effective tunnelling area were extracted from current versus voltage curves measured at room temperature. The effective tunnelling area ranged from 10−10 to 10−5 cm2, corresponding to less than 1% of the geometrical surface of the samples. The estimated electrical field to breakdown agreed with predictions from thermochemical models, and decreased exponentially with the effective tunnelling area.
- Published
- 2011
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