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Measurements of deep trap spectra in bulk β-Ga2O3 crystals showed the parameters of the two dominant centers with levels near Ec-0.8 eV (E2) and Ec-1 eV(E3) are affected the electric field during deep level transient spectroscopy (DLTS). Both DLTS spectra measurements of the emission rates of the E2 and E3 traps and measurements of emission rates as a function of electric field from capacitance decay curves obtained at a fixed temperature (380 K) show that, for strong electric field with magnitude above ∼5 × 105 V.cm−1, the emission rates of these traps increase with increasing field. For the E2 traps, the increase is driven by phonon assisted tunneling. This points to the trap being an acceptor, which is consistent with reported attribution of the center to substitutional Fe acceptors. For the E3 trap, the field dependence indicates the dominant mechanism is the Poole–Frenkel effect, operable for Coulombic centers. It is concluded that this commonly observed trap is a deep donor. [ABSTRACT FROM AUTHOR]

The effects of pulsed neutron irradiation on Si doped n-type β-Ga2O3 films grown by halide vapor phase epitaxy (HVPE) on bulk Sn doped n+ β-Ga2O3 substrates are reported. This irradiation leads to an almost linear increase with neutron fluence of the density of deep electron traps E2* (Ec − 0.74 eV), E3 (Ec − 1.05 eV), and E4 (Ec − 1.2 eV), with an introduction rate close to 0.4–0.6 cm−1 while the density of the E2 traps (Ec − 0.8 eV) related to Fe was virtually unchanged. In addition, the increase in the density of deep traps with optical ionization threshold of 1.3 eV, 2.3 eV, and 3.1 eV with an introduction rate close to 0.8–2 cm−1 was observed. The carrier removal rate under our conditions was 28 cm−1. Neutron irradiation also led to a measurable decrease of the diffusion length of nonequilibrium charge carriers. The results are qualitatively similar to previous reports for proton and α-particle irradiation of HVPE β-Ga2O3. When comparing the findings with those described earlier for bulk neutron irradiated Ga2O3, we observe lower starting densities of electron and hole traps and lower introduction rates for these traps in the epitaxial structures. The carrier removal rates were comparable to those in bulk crystals. [ABSTRACT FROM AUTHOR]

The effects of pulsed neutron irradiation on Si doped n-type β-Ga2O3 films grown by halide vapor phase epitaxy (HVPE) on bulk Sn doped n+ β-Ga2O3 substrates are reported. This irradiation leads to an almost linear increase with neutron fluence of the density of deep electron traps E2* (Ec − 0.74 eV), E3 (Ec − 1.05 eV), and E4 (Ec − 1.2 eV), with an introduction rate close to 0.4–0.6 cm−1 while the density of the E2 traps (Ec − 0.8 eV) related to Fe was virtually unchanged. In addition, the increase in the density of deep traps with optical ionization threshold of 1.3 eV, 2.3 eV, and 3.1 eV with an introduction rate close to 0.8–2 cm−1 was observed. The carrier removal rate under our conditions was 28 cm−1. Neutron irradiation also led to a measurable decrease of the diffusion length of nonequilibrium charge carriers. The results are qualitatively similar to previous reports for proton and α-particle irradiation of HVPE β-Ga2O3. When comparing the findings with those described earlier for bulk neutron irradiated Ga2O3, we observe lower starting densities of electron and hole traps and lower introduction rates for these traps in the epitaxial structures. The carrier removal rates were comparable to those in bulk crystals. [ABSTRACT FROM AUTHOR]