12 results on '"Endo, Katsuyoshi"'
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2. Development of Cleaning Method Using High-Speed Shear Flow of Ultrapure Water
3. Study of Cleaning Method for Si Substrate Using High-Speed Shear Flow of Ultrapure Water
4. Preparation of Silicon Dioxide thin films using both Monosilane and Ozone by Photo-CVD (Chemical Vapor Deposition) under Atmospheric Pressure
5. Development of a Measuring Instrument for Nanoparticles on the Si Wafer Using a Laser Light Scattering Method
6. Improvement of Thickness Uniformity of Quartz Crystal Wafer by Numerically Controlled Plasma CVM
7. Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evaluation of Focusing Properties
8. Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM
9. Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM
10. Flattening Si (001) surface by EEM (Elastic Emission Machining)
11. Measurement of Micro-Roughness on Si Wafer Surface Using System for Measuring Particle Diameter by Light-Scattering Method
12. Flattening of Si (001) Surface by EEM (Elastic Emission Machining)
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