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Template-assistedglancing angle deposition (GLAD) is explored for the fabrication ofsingle and multipatch patchy particles with one or more patches ofcontrolled but asymmetric shape. The template is used to ensure theformation of uniform patchy particles, whereas rotation of the templategives access to a large number of asymmetric patch shapes caused bythe shadowing effect of the templating groove and/or the neighboringparticle. Careful analysis with a straightforward geometric modelreveals the effect of the angle of incidence, rotational angle, groovesize, and particle size on the patch shape. Initial magnetic fieldassembly results are presented to illustrate the removal of patchyparticles from their template and accessibility to a large numberof patchy particles. Two-patch particles with overlapping patchesare also accessible by means of secondary metal vapor deposition.The connectivity of these two patches on each particle and the predictablesize of the overlapping section provide access to functional patchyparticles. The combination of the template-assisted GLAD method withrotation of the template and secondary evaporation is demonstratedto be a good method for fabricating patchy particles with a varietyof asymmetric patch shapes, sizes, and multipatches where every particleof a batch carries exactly the same patch pattern and thereby providesvaluable input on experimentally accessible patch shapes for futureexperimental and computational studies of patchy particles. [ABSTRACT FROM AUTHOR]

Patchy particles with uniform patches of specific shapeand sizehave been predicted to have a rich potential in fabricating new structures;however, an effective method to control the patch shape and size isstill missing. In the method presented here, a template is used toassist the fabrication of patchy particles with patches of uniformshape and controlled size by use of the glancing angle depositionmethod (GLAD). Uniform shadowing effects are caused by the wall ofthe grooves carved into the surface of a silicon wafer. The ratioof template dimension to particle diameter and the angle of incidenceof the metal vapor rays determine the patch shape and size. Mathematicalcalculations are applied to predict the patch shape and size. Scanningelectron microscopy is used to demonstrate the efficiency of the method.Scaling analysis shows that the template-assisted GLAD method leadsto a 3100-fold increase in patchy particle fabrication volumes comparedto the template-free GLAD method. [ABSTRACT FROM AUTHOR]