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Patterned multilayer films composed of poly(allylamine hydrochloride) (PAH) and poly(sodium 4-styrenesulfonate) (PSS) were prepared using dip and spin self-assembly (SA) methods. A silicon substrate was patterned with a photoresist thin film using conventional photolithography, and PAH/PSS multilayers were then deposited onto the substrate surface using dip or spin SA. For spin SA, the photoresist on the substrate was retained, despite the high centrifugal forces involved in depositing the polyelectrolytes (PEs). The patterned multilayer films were formed by immersing the PE-coated substrates in acetone for 10 min. The effect of ionic strength on the pattern quality in dip and spin multilayer patterns (line-edge definition and surface roughness of the patterned region) was investigated by increasing the salt concentration in the PE solution (range 0-1 M). In dip multilayer patterns, the presence of salt increased the film surface roughness and pattern thickness without any deformation of pattern shape. The spin multilayer patterns formed without salt induced a height profile of about 130 nm at the pattern edge, whereas the patterns formed with high salt content (1 M) were extensively washed off the substrates. Well-defined pattern shapes of spin SA multilayers were obtained at an ionic strength of 0.4 M NaCl. Multilayer patterns prepared using spin SA and lift-off methods at the same ionic strength had a surface roughness of about 2 nm, and those prepared using the dip SA and lift-off method had a surface roughness of about 5 nm. The same process was used to prepare well-defined patterns of organic/metallic multilayer films consisting of PE and gold nanoparticles. The spin SA process yielded patterned multilayer films with various lengths and shapes.

Multilayer thin films were constructed on polystyrene colloidal particles by depositing alternating layers of poly(allylamine hydrochloride) (PAH) at pH 7.5 and varying composition blends of poly(acrylic acid) (PAA) and poly(styrenesulfonate) (PSS) at pH 3.5. Following the deposition of each layer, microelectrophoresis experiments showed alternating zeta-potentials, suggesting the formation of multilayered films on the particles. Scanning and transmission electron microscopy were used to examine the surface morphology of the colloidal particles, with homogeneous surface coatings apparent for films deposited from PAA/PSS blend solutions containing up to 90 wt % PAA. The colloidal stability of these particles is greater than those coated with individual PAH and PAA layers. In the case of the blend PAA/PSS = 25:75 wt %, up to 20 layers were assembled without compromising the colloidal stability of the dispersion. The results demonstrate that the deposition of layers from PE blend solutions containing a strong and weak PE can be used as a facile method for controlling the surface properties and hence the colloidal stability of core-shell particles, as well as the thickness and morphology of the coatings. Control of these parameters is important for subsequent processing and application of these particles in controlled delivery, photonics, catalytic, and separation applications.

We investigated the correlation between surface wettability and internal structure of polyelectrolyte (PE)/PE and PE/inorganic multilayer films prepared by the spin self-assembly (SA) method. Spin self-assembled poly(allylamine hydrochloride) (PAH)/poly(sodium 4-styrenesulfonate) (PSS) multilayer films deposited from PE solutions of 10 mM show the distinct oscillation in contact angles with variation of the outermost PE layer, representing the saturated values in contact angles of individual PAH and PSS layers. These contact angles are also well consistent with the angles measured from respective PE layers (i.e., PAH and PSS) of the spin SA (PAH/CdS-COO-) and (CdS-NH3+/PSS) films carrying the flat interface between PE and inorganic CdS nanoparticle layers as confirmed by X-ray reflectivity. Furthermore, based on the contact angle of CdS-NH3+ layer in the ordered (CdS-NH3+/PSS) films, the change in surface wettability of CdS-NH3+ layers of two different spin SA (CdS-NH3+/poly(methacrylic acid) (PMAA)) multilayer films with ordered and disordered internal structure is also investigated. The films with ordered and disordered internal structure were fabricated by the pH adjustment of PMAA. The CdS-NH3+ layer in both CdS-NH3+/PSS and CdS-NH3+/PMAA multilayer films with the ordered internal structure has the contact angle of about 25 +/- 2 degrees irrespective of the PSS or PMAA sublayer. As a result, the same surface wettability of PE or inorganic layers, despite different sublayers, strongly indicates that the spin SA method in optimum condition allows the top surface to be completely covered with a low level ofinterdigitation with a sublayer at each deposition step, and this leads to the conclusion that physical and chemical characteristics of the sublayers have no significant influence on those of the outermost layer.