1. Low-temperature bonding of Cu on Si3N4 substrate by using Ti/Cu thin films.
- Author
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Song, Yanyu, Liu, Ling, Liu, Duo, Song, Xiaoguo, and Cao, Jian
- Subjects
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THIN films , *BRAZING alloys , *COPPER films , *SILICON nitride , *RESIDUAL stresses - Abstract
[Display omitted] • The low-temperature bonding of Si 3 N 4 and Cu was achieved using Ti/Cu films. • It is an effective means of relieving stress caused by Si 3 N 4 /Cu CTE mismatch. • An efficient Cu-on-Si 3 N 4 structure for power devices is expected. A low-temperature bonding method of Si 3 N 4 /Si 3 N 4 homostructure and Si 3 N 4 /Cu heterostructure was developed in this work. The flawless interfaces were obtained by sputtered Ti/Cu thin films after bonding at 250 °C for 30 min under a uniaxial pressure of 20 MPa. The Ti film is able to improve the adhesion of the Cu film to Si 3 N 4 substrate, and the low-temperature bonding was achieved in view of high diffusion rates of Cu nanocrystalline film with (1 1 1) crystal plane. This proof-of-concept study on the low-temperature bonding of Si 3 N 4 ceramic to Cu is expected to address residual stress caused by ordinary active metal brazing (AMB) method, which provides insights for the further heterogeneous integrations of ceramics to metals. [ABSTRACT FROM AUTHOR]
- Published
- 2022
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