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Abstract: An amorphous MnO1.9 thin film was deposited by magnetron sputtering with manganese as the target. The morphology and structure of the deposited MnO1.9 thin film were investigated. The MnO1.9 thin film presented amorphous structure in X-ray diffraction measurement. In transmission electron microscopy, it was revealed that the MnO1.9 particles distributed homogenously on the copper substrate and the diameters of particles were less than 10nm. The cyclic voltammetry and galvanostatical discharge–charge curves indicated that the MnO1.9 thin film had regular capacitive behaviors and delivered a maximum capacitance of 50.2mF/cm2 μm and 23.3mF/cm2 μm under 0.1mA/cm2 and 1.0mA/cm2 current densities, which demonstrated that the amorphous MnO1.9 thin film was a potential good electrode material for supercapacitor application. [Copyright &y& Elsevier]

Abstract: α-MnO2 nanorod was prepared by chemical precipitation with surfactant as the structure-directing agent and subsequent heat treatment at 800°C. The morphology and structure of the prepared α-MnO2 were investigated by transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). It was revealed that the α-MnO2 nanorod was successfully synthesized without impurities and the diameter of the nanorod was less than 50nm. In cyclic voltammetry and galvanostatical discharge–charge test, the α-MnO2 nanorod showed regular capacitive behaviors and good cycling stabilities and delivered a maximum capacitance of 166.2F/g, which indicated that the α-MnO2 nanorod was a potential good electrode material for supercapacitor application. [ABSTRACT FROM AUTHOR]