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This study involved the preparation of an all-solid-state ion-selective electrode (ASS-ISE) with copper and a poly(3,4-ethylenedioxythiophene) and polystyrene sulfonate (PEDOT/PSS) conversion layer through electrode deposition. The morphology of the PEDOT/PSS film was characterized, and the performance of the copper ion-selective film was optimized. Additionally, a microfluidic chip for the ASS-ISE with copper was designed and prepared. An integrated microfluidic chip test system with an ASS-ISE was developed using a self-constructed potential detection device. The accuracy of the system was validated through comparison testing with atomic absorption spectrophotometry (AAS). The experimental findings indicate that the relative standard deviation (RSD) of the integrated ASS-ISE with the copper microfluidic chip test system is 4.54%, as compared to the industry standard method. This value complies with the stipulated requirement of an RSD ≤ 5% in DL/T 955-2016. [ABSTRACT FROM AUTHOR]

This study involved the preparation of an all-solid-state ion-selective electrode (ASS-ISE) with copper and a poly(3,4-ethylenedioxythiophene) and polystyrene sulfonate (PEDOT/PSS) conversion layer through electrode deposition. The morphology of the PEDOT/PSS film was characterized, and the performance of the copper ion-selective film was optimized. Additionally, a microfluidic chip for the ASS-ISE with copper was designed and prepared. An integrated microfluidic chip test system with an ASS-ISE was developed using a self-constructed potential detection device. The accuracy of the system was validated through comparison testing with atomic absorption spectrophotometry (AAS). The experimental findings indicate that the relative standard deviation (RSD) of the integrated ASS-ISE with the copper microfluidic chip test system is 4.54%, as compared to the industry standard method. This value complies with the stipulated requirement of an RSD ≤ 5% in DL/T 955-2016.