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We report nonlinear optical investigation of green emission GaInN/GaN multi-quantum structures grown along c- and m-axes on sapphire and bulk GaN substrates, respectively. Under intense pulsed photo excitation, we observed strong superluminescence near the lasing condition in c-plane grown quantum well structures with full width at half maximum of 6 nm. The superluminescence couples out of the edge of the sample in a mode pattern consistent with gain in a high mode of the waveguide. The wavelength of the superluminescence is 474 nm. The threshold intensity of superluminescence was found to be 156 kW/cm2. Increasing pump intensity leads to a strong photoluminescence blueshift as large as 380 meV in samples grown along the c-axis on sapphire substrate, while under the same excitation conditions, the blue shift for the m-axis grown structure on bulk GaN substrate is less than 10 meV. The large emission blueshift is hereby attributed to the internal piezoelectric field in the c-axis grown structure. We observe a gain value of 20 cm-1 together with internal absorption losses of 2.3 – 6.0 cm-1 for the superluminescent samples.

Time-resolved photoluminescence studies can provide useful information for the development of InGaN/GaN heterostructures for long wavelength visible emitters. In this paper, we present results of time-resolved photoluminescence from samples grown using two different approaches to achieve green emission from InGaN/GaN MQWs. In one approach, samples, with high indium incorporation, were grown on a high quality AlN substrate to achieve green emission. The resulting photoluminescence decay of the green luminescence is long-lived and non-exponential. Quantitative analysis showed that the decay has a stretched-exponential characteristic, typical of InGaN/GaN MQW with potential fluctuation along the growth plane. This carrier localization, in a structure with low defect density, proves to be an effective means to achieve green emission. In another approach, a piezoelectric Stark-like ladder effect is used. In this case, a methodical layer-by-layer growth homogeneity optimization process was adopted to achieve an optical transition below the electron to heavy-hole (e1hh1) transition when the quantum well is subjected to the strong piezoelectric polarization dipole. This approach has proven to be successful in achieving green luminescence on conventional sapphire substrates. The resulting photoluminescence decay at 14 K, of a sample grown by this approach, is single exponential and shorter in duration than the decay observed in the first approach. This exponential decay is consistent with previous AFM studies that revealed a homogeneous active region.

In an attempt to identify the performance limiting factors of green GaInN/GaN light emitting diodes (LEDs) we analyze a large number of LED dies fabricated from over 160 epitaxy runs covering the wavelength range from 390 – 580 nm on a quantitative scale of the emission power. As a function of drive current, we analyze the external quantum efficiency (EQE) with particular emphasis on the low current range. We observe three very distinct populations of EQE behaviors. We find that the EQE maximum value has a strong correlation with the forward current in this point, while it has weak correspondences with both, the forward voltage in this point, and the dominant wavelength at 20 mA. The very good linear relationship between the forward voltage in green LED dies at 1 mA and at 20 mA is also observed. All those characteristics are meaningful traits to ultimately converge to a physical electronic transport and bandstructure model for the next step enhancement of green and deep green GaInN/GaN LED performance.

A detailed modeling of the electronic bandstructure of GaInN alloys and GaInN/GaN heterostructures typically used for high efficiency light emitting diodes is of high relevance for future improvements. Here we are exploring opportunities to accurately quantify the carrier dynamics under forward and reverse voltage bias. In GaInN/GaN LED-type heterostructures we observe distinct steps in the junction capacitance as a function of bias voltage within the depletion regime. Up to three individual steps can be identified that correspond to alternating ranges of capacitive and resistive impedances. Our analysis suggests that we are quantitatively monitoring the electron concentration in each individual quantum well. The pronounced clarity of the data reveals a high level of epitaxial perfection and spatial homogeneity across the entire area of the junction.

Defects and stress are the most serious issues for growth of AlGaN. Low-temperature deposited (LT -) AlN interlayer between AlGaN and GaN is found to reduce tensile stress during growth, and at the same time suppress the propagation of dislocations having screw components, by which UV-photodetector showing very-low-dark current has been successfully fabricated. However, additional pure-edge dislocations are generated at the LT -interlayer, which resulted in the poor emission property. In addition to the LT -interlayer, lateral growth at the trenched structure was used, thereby achieving crack-free AlGaN and reduction of the density of all types of dislocations in the AlGaN layer. UV light emitting diodes having AlGaN/GaN multi-quantum well active layer was fabricated on the low dislocation density AlGaN. The LED shows strong and sharp UV-emission from GaN-wells.

Identification of the electronic band structure in AlInGaN heterostructures is the key issue in high performance light emitter and switching devices. In device-typical GaInN/GaN multiple quantum well samples in a large set of variable composition a clear correspondence of transitions in photo- and electroreflection, as well as photoluminescence is found. The effective band offset across the GaN/GaInN/GaN piezoelectric heterointerface is identified and electric fields from 0.23 - 0.90 MV/cm are directly derived. In the bias voltage dependence a level splitting within the well is observed accompanied by the quantum confined Stark effect. We furthermore find direct correspondence of luminescence bands with reflectance features. This indicates the dominating role of piezoelectric fields in the bandstructure of such typical strained layers.

Details of the electronic bandstructure in pseudomorphic Gal-xInxN/GaN single heterostructures (0 < x < 0.22) are studied. In photocarrier modulated reflectance strong modulation of the density of states (Franz-Keldysh oscillations) is found due to a piezoelectric field of about 0.6 MV/cm in the strained layer. No excitons are expected to form in the presence of this field. Studying the composition dependence we determine a piezoelectric coefficient ∂|P|/∂εzz = 0.46 C/m2 and extrapolate a spontaneous polarization in GaN |Peq| = 3.9 mC/m2. Photoreflection indicates the presence of localized tail states 50 – 100 meV below the bandgap which are well explained by the Franz-Keldysh effect involving k non-conserving transitions in the large electric field. Luminescence is found to originate in these electric field induced states. The derived bandgap energies can be approximated by an interpolation yielding bowing parameters b = 2.6 eV (photoreflection) and b = 3.2 eV (luminescence) for pseudomorphic films with 0.07 ≤ x ≤ 0. 22. These findings may affect interpretation of device performance.

We report on the first scanned-angle x-ray photoelectron diffraction measurements on GaN(0001) in the wurtzite structure, as grown on sapphire substrates using MOCVD. These as-grown samples reveal forward scattering peaks in agreement with a theoretical calculation using a single scattering cluster calculation. The surface contamination by O and C does not exhibit any clear structure. From the combination of experiment and theoretical calculation and from a simple intensity ratio argument the surface termination for these samples could be determined to be N. The data also indicate that C is on average closer to the GaN surface than O.

Crystalline quality of nitrides on sapphire by OMVPE has been investigated. First, in-situ observations of the crystallization process of the low temperature deposited AIN buffer layer or GaN buffer layer on sapphire substrate have been performed. Small hexagonal mesas were formed from the sapphire to the surface and finally they formed a stacked structure. Secondly, a low temperature deposited buffer layer located between the high temperature grown GaN was found to reduce the etch pit density of GaN films. Thirdly, structural properties of Ga1−xInxN (0 ≤x≤0.21, and x= l) on GaN and GaInN/GaN MQWs on GaN have been characterized by Xray diffraction. Coherently grown GaInN showed almost the same twisting as the underlying GaN layer, while free standing InN showed large twisting. Thickness of the well layers in MQWs has been controlled within one monolayer preciseness, and the fluctuation of alloy composition has been controlled to within 2%

Properties of GaN and its alloys are strongly controlled by impurities and strain. Using large hydrostatic and biaxial pressure we identify the role of donor dopants and stress induced fields. The doping of Si and 0 as relevant representatives of group-IV and group-VI impurities are studied in Raman spectroscopy. For pressures above 20 GPa we find that oxygen induces a strongly localized gap state while Si continues to behave as a hydrogenic donor. Such a DX-like behavior of 0 indicates and corresponds to doping limitations in AIGaN alloys. The site specific (ON, SiGa) formation of a gap-state is attributed to bond strengths of the respective neighbors. In photoreflection of pseudomorphic GaInN we observe pronounced Franz-Keldysh oscillations corresponding to piezoelectric fields of 0.6 MV/cm. An observed redshift of the luminescence is found to originate in electric field induced tailstates. A reduced but similar effect is expected for GaN possibly explaining observations of persistent photoconductivity in a wide range of materials.

GaN plays a key role in the exploration of the properties of group-Ill nitrides. As grown GaN often shows a high electron concentration, e.g. 1019 cm−3, of as yet unidentified origin. Applying large hydrostatic pressure we studied the behavior of these donors and a frequently observed strong luminescence band at 3.42 eV. We find a drop of the electron concentration to 3×1017 cm−3 at 27 GPa and derive a binding energy of 126 meV for the neutral singlet donor level at this pressure. Such a pressure behavior of a donor is consistent with the model of strongly localized defects. Within the framework of a bandstructure calculation we predict the neutral level of this donor at 0.40 ± 0.10 eV above the conduction band edge at ambient pressure.

Free and bound exciton luminescences as well as donor-acceptor pair recombination of GaN epitaxial layers on 6H-SiC and sapphire substrates were investigated using time integrated and time resolved photoluminescence measurements at low temperatures. Lifetimes are determined for the donor bound exciton at 3.4722eV and for two acceptor bound excitons with energies of 3.4672eV and 3.459eV. Luminescences between 3.29eV and 3.37eV are identified as due to excitons deeply bound to centers located near the substrate-epilayer interface.

A luminescence band centered around 3.42 eV is commonly observed in GaN. Its appearance has been tentatively assigned to an oxygen donor level. Stimulated laser activity has also been reported at this energy. We present a study of this band in GaN grown by high temperature vapor phase epitaxy (HTVPE). The high quality of this material, with an excitonic line width as narrow as 3 meV, allows us to distingish four different peak positions of this luminescence band. They appear at 3.4066, 3.4121, 3.4186, and 3.4238 eV (T = 6 K). Within the experimental error the lines exhibit an equidistant spacing of 6 meV. They show a pressure behavior similar to shallow levels described by effective mass theory. We discuss our results in the context of incorporation of oxygen and structural defects in GaN.

We present a photoluminescence study of residual transition metal contaminants in hexagonal GaN layers. We observe three no-phonon lines peaking at 1.3 eV, 1.19 eV and 1.047 eV. The no-phonon line at 1.3 eV is caused by the internal electronic transition 4T 1→ 6A1 of Fe3+. The 1.19 eV emission, which was first attributed to Cr4+, is caused by Ti2+. GaN layers intentionally doped with Cr, V, or Ti during growth have been investigated. Only the Ti doped samples snow an intense sienal of the 1.19 eV emission. The experimental data of the luminescence center at 1.047 ev, which appears as natural contaminant only in GaN layers grown by the sandwich technique, fit best to the 4T2(F) → 4A2(F) transition of Co2+. The three no-phonon lines show characteristic phonon sidebands. Most of them correspond to phonon modes observed in Raman spectroscopy.

Recent progress in the growth of high quality 6H-SiC single crystals has led to an ideal substrate material for GaN epitaxial films. Nearly matching lattice constants of wurzite GaN to 6H-SiC in the hexagonal plane can reduce strain effects at the interface. We employed the sublimation sandwich method to grow single crystal layers at reasonable growth rates with free carrier concentrations of 2×1017 cm-3. Very sharp x-ray diffraction peaks of the GaN (0002) plane are obtained indicating the high quality of this system (Δ(2θ) < 0.1 degrees). These findings are directly reflected in the optical properties. The photoluminescence is dominated by a single sharp exciton line, impurity related donor acceptor transitions are seen with very weak intensities. However, at lower energies the internal luminescence transitions of the 3d transition metal ions Fe and V are observable. The incorporation of Fe is confirmed by electron paramagnetic resonance.

Amorphous multilayers with low interface defect density were deposited in an ultrahigh-vacuum RF-glow discharge reactor by computer-controlled fast gas switching. An extensive film characterization was done including determination of carbon content by PES (proton enhanced scattering), grazing-incidence X-ray diffraction, measurement of ambipolar diffusion length, FTIR spectroscopy and hydrogen effusion. From PDS (photothermal deflection spectroscopy) a defect density of below 1011 cm−2 per interface is found.

The quaternary GaxIn1−xAsyP1−y semiconductor alloy system has considerable importance for present day optoelectronic and microwave device applications. For state of the art high mobility samples grown by metal organic chemical vapor deposition (MOVPE) there are few experimental techniques which both can asess band structure related properties (effective mass m*, g-values of free electrons) and impurity related properties (luminescence, mobility and lifetimes). In this paper we compare optical and transport properties of the quaternary compound GaxIn1−xAsyP1−y, (x=0.47,y-l; x=0.42,y=0.92; x=0.28,y=0.61; x=0.12,y=0.34) lattice matched to*{nP by optically detected magnetic resonance techniques.