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Nitrogen vibrational mode spectra, Hall mobilities, and minority carrier diffusion lengths are examined for InGaAsN (≈ 1.1 eV bandgap) grown by molecular beam epitaxy (MBE) and metal-organic chemical vapor deposition (MOCVD). Independent of growth technique, annealing promotes the formation of In-N bonding, and lateral carrier transport is limited by large scale (Ęmean free path ) material inhomogeneities. Comparing solar cell quantum efficiencies for devices grown by MBE and MOCVD, we find significant electron diffusion in the MBE material (reversed from the hole diffusion occurring in MOCVD material), and minority carrier diffusion in InGaAsN cannot be explained by a “universal”, nitrogen-related defect.

The bandgap of InP is near ideal for the high theoretical conversion efficiency of the air mass zero (AM0) light spectrum experienced in space. This combined with the well known radiation resistance makes InP an ideal candidate for space solar cell use. The p/n configuration has several advantages over the n/p configuration, however, the conversion efficiency of p/n InP cells has been low compared to the n/p configuration, mostly do to poor performance of the Zn doped emitter. We have recently achieved a 17.6% AMO conversion efficiency for a p/n InP cell on an InP substrate and have achieved this record efficiency through understanding of the role of Zn interstitial defects and the hydrogen interactions with these defects. The effect of the Zn defect on device performance will be described.

Deep levels in MOCVD grown p-InP on GaAs substrates have been investigated by Deep Level Transient Spectroscopy (DLTS). The effect of hydrogenation on the electrical activity of these levels has been studied through a combination of DLTS and Photoluminescence (PL) measurements. DLTS measurements indicate a drop of trap density from σ 5 × 1014 cm−3 to σ 1 × 1012 cm−3 after hydrogenation. Annealing at 400°C reactivated only the dopants, while temperatures above 600°C were necessary for deep-level reactivation. This combined with a logarithmic dependence on fill pulse time, indicate that at least one broad DLTS peak is associated with dislocations. The PL the DLTS results show that the dislocation related traps are passivated by hydrogen, preferentially over the dopants and that a wide annealing window exists for dopant reactivation.

Ellipsometric measurements on plasma deposited “diamondlike” amorphous carbon (a-C:H) films were taken in the visible, (E = 1.75 to 3.5 eV). The films were deposited on Si and their properties were varied using high temperature (up to 750 °C) anneals. The real (n) and imaginary (k) parts of the complex index of refraction N were obtained simultaneously. Following the theory of Forouhi and Bloomer (Phys. Rev. B34, 7018 (1986)), a least squares fit was used to find the dispersion relations n(E) and k(E). Reasonably good fits were obtained, showing that the theory can be used for a-C:H films. Morever, the value of the energy gap Eg obtained in this way was compared to the Eg value using conventional Tauc plots and reasonably good agreement was obtained.