1. Atomic layer deposition of NiO hole-transporting layers for polymer solar cells
- Author
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Cheng-Hung Hou, Heng-Wei Su, Feng-Yu Tsai, Jing-Jong Shyue, and Che-Chen Hsu
- Subjects
chemistry.chemical_classification ,Materials science ,Fabrication ,business.industry ,Mechanical Engineering ,Non-blocking I/O ,Energy conversion efficiency ,Bioengineering ,Nanotechnology ,General Chemistry ,Polymer ,Polymer solar cell ,Atomic layer deposition ,chemistry.chemical_compound ,chemistry ,Mechanics of Materials ,Optoelectronics ,General Materials Science ,Polystyrene ,Electrical and Electronic Engineering ,business ,Deposition (law) - Abstract
NiO is an attractive hole-transporting material for polymer solar cells (PSCs) owing to its excellent stability and electrical/optical properties. This study demonstrates, for the first time, fabrication of uniform, defect-free, and conformal NiO ultra-thin films for use as hole-transporting layers (HTLs) in PSCs by atomic layer deposition (ALD) through optimization of the ALD processing parameters. The morphological, optical, and electrical properties of ALD NiO films were determined to be favorable for their HTL application. As a result, PSCs containing an ALD NiO HTL with an optimized thickness of 4 nm achieved a power conversion efficiency (PCE) of 3.4%, which was comparable to that of a control device with a poly(3,4-ethylenedioxy-thiophene):poly(styrene-sulfonate) HTL. The high quality and manufacturing scalability of ALD NiO films demonstrated here will facilitate the adoption of NiO HTLs in PSCs.
- Published
- 2015
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