1. Order quantification of hexagonal periodic arrays fabricated by in situ solvent-assisted nanoimprint lithography of block copolymers
- Author
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Worawut Khunsin, Michael A. Morris, Claudia Simao, N. Kehagias, Mathieu Salaun, Clivia M. Sotomayor Torres, Marc Zelsmann, Optique et Matériaux (NEEL - OPTIMA), Institut Néel (NEEL), Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Centre National de la Recherche Scientifique (CNRS)-Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Centre National de la Recherche Scientifique (CNRS), Laboratoire des technologies de la microélectronique (LTM), Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS), European Commission, Ministerio de Economía y Competitividad (España), Optique et Matériaux (OPTIMA), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Centre National de la Recherche Scientifique (CNRS)-Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Centre National de la Recherche Scientifique (CNRS)-Université Joseph Fourier - Grenoble 1 (UJF), and Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Joseph Fourier - Grenoble 1 (UJF)-Centre National de la Recherche Scientifique (CNRS)
- Subjects
Diffraction ,Materials science ,Silicon ,FOS: Physical sciences ,chemistry.chemical_element ,Bioengineering ,Grating ,Nanoimprint lithography ,law.invention ,Polyethylene Glycols ,X-Ray Diffraction ,law ,General Materials Science ,Wafer ,Electrical and Electronic Engineering ,Thin film ,GISAXS ,ComputingMilieux_MISCELLANEOUS ,[PHYS]Physics [physics] ,Condensed Matter - Materials Science ,business.industry ,Mechanical Engineering ,Materials Science (cond-mat.mtrl-sci) ,Nanometrology ,General Chemistry ,Block copolymers ,Directed self-assembly ,Nanostructures ,chemistry ,Mechanics of Materials ,Grazing-incidence small-angle scattering ,Optoelectronics ,Polystyrenes ,Nanodot ,business - Abstract
arXiv:1403.2250v1, Directed self-assembly of block copolymer polystyrene-b-polyethylene oxide (PS-b-PEO) thin film was achieved by a one-pot methodology of solvent vapor assisted nanoimprint lithography (SAIL). Simultaneous solvent-anneal and imprinting of a PS-b-PEO thin film on silicon without surface pre-treatments yielded a 250 nm line grating decorated with 20 nm diameter nanodots array over a large surface area of up to 4' wafer scale. The grazing-incidence small-angle x-ray scattering diffraction pattern showed the fidelity of the NIL stamp pattern replication and confirmed the periodicity of the BCP of 40 nm. The order of the hexagonally arranged nanodot lattice was quantified by SEM image analysis using the opposite partner method and compared to conventionally solvent-annealed block copolymer films. The imprint-based SAIL methodology thus demonstrated an improvement in ordering of the nanodot lattice of up to 50%, and allows significant time and cost reduction in the processing of these structures., The research leading to these results received funding from the European Union FP7 under the project LAMAND (grant agreement n° 245565), NANOFUNCTION (grant agreement no. 257375, FP7-ICT-2009-5) and by the Spanish Ministry of Economics and Competitiveness under project TAPHOR contract no. MAT2012-31392 (Plan Nacional de I + D + I (2008–2011)
- Published
- 2014
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