3 results on '"Ma, Wenxuan"'
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2. Effect of electrical stress on time dependent dielectric breakdown (TDDB) tolerate capability of HfO2–ZrO2 ferroelectric films with different thicknesses.
3. Effect of electrical stress on time dependent dielectric breakdown (TDDB) tolerate capability of HfO 2 -ZrO 2 ferroelectric films with different thicknesses.
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