1. Fabrication of sub-100 nm patterns in SiO2 templates by electron-beam lithography for the growth of periodic III–V semiconductor nanostructures
- Author
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Peng Chen, A. Chen, L K Jian, Soo Jin Chua, and X Y Chen
- Subjects
Materials science ,business.industry ,Mechanical Engineering ,Nanowire ,Bioengineering ,Nanotechnology ,General Chemistry ,Resist ,Mechanics of Materials ,Sapphire ,Optoelectronics ,General Materials Science ,X-ray lithography ,Nanodot ,Electrical and Electronic Engineering ,Reactive-ion etching ,business ,Lithography ,Electron-beam lithography - Abstract
We report on the fabrication process of SiO2 templates with periodic sub-100 nm patterns by electron-beam (e-beam) lithography followed by reactive ion etching. One-dimensional and two-dimensional periodic patterns were defined in 350 nm polymethylmethacrylate resist by e-beam lithography, and then transferred into 100 nm SiO2 layers which were coated on GaAs or GaN/sapphire substrate. Patterns including line arrays and square/hexagonal hole arrays were obtained in the SiO2 layers with sizes ranging from 100 nm to 52 nm in width or diameter. A pattern size deviation of less than 4% in a hole array of 100 µm by 100 µm was achieved. The patterned SiO2 layers can serve as templates for the growth of periodic III–V semiconductor nanostructures. In this work, periodic InGaN nanowires and nanodots with high optical quality have been fabricated successfully by using the SiO2 templates on GaN/sapphire.
- Published
- 2006
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