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We report a single-mode 1180 nm distributed Bragg reflector (DBR) laser diode with a high output power of 340 mW. For the fabrication, we employed novel nanoimprint lithography that ensures cost-effective, large-area, conformal patterning and does not require regrowth. The output characteristics exhibited outstanding temperature insensitivity with a power drop of only 30% for an increase of the mount temperature from 20°C to 80°C. The high temperature stability was achieved by using GaInNAs/GaAs quantum wells (QWs), which exhibit improved carrier confinement compared to standard InGaAs/GaAs QWs. The corresponding characteristic temperatures were Tsub0/sub=110 K and Tsub1/sub=160 K. Moreover, we used a large detuning between the peak wavelength of the material gain at room temperature and the lasing wavelength determined by the DBR. In addition to good temperature characteristics, GaInNAs/GaAs QWs exhibit relatively low lattice strain with direct impact on improving the lifetime of laser diodes at this challenging wavelength range. The single-mode laser emission could be tuned by changing the mount temperature (0.1 nm/°C) or the drive current (0.5 pm/mA). The laser showed no degradation in a room-temperature lifetime test at 900 mA drive current. These compact and efficient 1180 nm laser diodes are instrumental for the development of compact frequency-doubled yellow-orange lasers, which have important applications in medicine and spectroscopy.

We report a 671 nm laser source emitting 225 ps pulses with an average power of 55 mW and a repetition rate of 444 kHz. The system consists of a 1342 nm SESAM Q-switched Nd:YVOsub4/submicrochip master oscillator and a dual-stage Nd:YVOsub4/subpower amplifier. The 1342 nm signal was frequency-doubled to 671 nm using a periodically poled lithium niobate crystal. This laser source provides a practical alternative for applications requiring high energy picosecond pulses, such as time-gated Raman spectroscopy.