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The threshold voltage ( VT) instability of metal-insulator-semiconductor high electron mobility transistors (MIS-HEMTs) is investigated. In the enhancement-mode AlGaN/GaN MIS-HEMT fabricated by fluorine plasma implantation technique featuring Al2O3 gate dielectric, a hysteresis of 0.6 V in transfer characteristics is observed by quasi-static I - V (current-voltage) measurement, in which the gate bias is swept at a low rate (0.7 V/s). Pulsed transfer characteristics measurement, however, unveils much larger hysteresis under the same gate voltage swing. The VT-instability is attributed to the traps located at the dielectric/III-nitride interface as well as in the bulk of gate dielectric. It is proposed that pulsed measurement can count for the effect of fast traps (shallow traps) while the quasi-static measurement can only reflect slow traps (deep traps), and is more accurate for VT-instability evaluation. In addition, the existence of bulk traps is implied by a slow time-dependent shift of VT under large gate bias. (© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) [ABSTRACT FROM AUTHOR]