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Start Over Author "Prasad, P.V. Vara" Journal plant stress
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3. Silicon and nitric oxide modulate growth attributes, antioxidant defense system and osmolytes accumulation in radish (Raphanus sativusL.) under arsenic toxicity

Author

Bhardwaj, Savita, Verma, Tunisha, Kour, Jaspreet, Singh, Arun Dev, Bhardwaj, Renu, Sharma, Neeta Raj, Ansari, Shabnam, Raza, Ali, Prasad, P.V. Vara, Thakur, Usha, and Kapoor, Dhriti

Abstract

•Arsenic (As) presence has become a threat to agricultural productivity globally.•Here, As stress negatively affected the vital parameters of the radish seedlings.•Si and NO enhance growth traits, carbohydrates/protein contents and antioxidant defense under As stress.•Si and NO treatment decreased oxidative markers, membrane, and nuclear damage in Asstressed seedlings•Combined Si+NO showed better results than alone in reducing As stress in radish seedlings.

Published
2024
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