Search

In the present study is shown a novel vacuum-based technique that enables production of hard polymeric nanocomposite coatings with metal (Cu) nanoparticles. This method is based on the use of gas aggregation source (GAS) of Cu nanoparticles and plasma-enhanced chemical vapour deposition of a-C:H matrix that was deposited in a mixture of Ar and n-hexane on the substrates placed on the powered RF electrode. This approach makes it possible to control independently both the properties of the matrix by variation of the applied RF power and the amount of incorporated Cu nanoparticles that may be adjusted by operational parameters of the GAS. Characterisation of the films in terms of their chemical composition, morphology, optical and mechanical properties is described here alongside with description of Cu nanoparticles production using GAS with variable aggregation length.

The nanocomposite films Ag/a-C:H were prepared by vacuum-based method which combines deposition of Ag nanoparticles by means of gas aggregation source (GAS) and PECVD deposition of a-C:H matrix. The matrix was deposited in a mixture of Ar and n-hexane on the substrates placed on the powered RF electrode facing the beam of Ag NPs from the GAS. Anisotropic plasma etching was used to increase Ag concentration on the surface of the coating. The influence of three types of plasma on the chemical composition of the coatings and on the size of Ag nanoparticles is described. It is shown that the best etching selectivity and thus the highest Ag surface concentration was reached in case of etching of grounded samples in low pressure oxygen plasma. This treatment enhances the short term antibacterial efficiency of produced coatings.