1. Dynamics of pulsed reactive RF discharges in response to thin film deposition.
- Author
-
Sikimić, B, Stefanović, I, Denysenko, I B, Winter, J, and Sadeghi, N
- Subjects
INDUSTRIAL contamination ,THIN film deposition ,RADIO frequency ,ARGON plasmas ,AMORPHOUS carbon ,HYDROCARBONS ,INTERFEROMETRY - Abstract
A power-modulated radio-frequency (f = 13.56 MHz) argon plasma supplied by reactive acetylene to deposit an amorphous hydrocarbon film on the electrodes is studied. The effects of gradual film deposition on electron density, electron temperature, argon metastable Ar
m (3 P2 ) density, and dc-bias voltage are investigated. The time evolutions of plasma parameters during a pulsing cycle are studied as a function of the applied RF power and the thickness of the deposited film. Analytical estimations show a slower expansion of the sheath size and a slower decay of the ion flux after film deposition on the electrodes. The observed changes in the plasma parameters during the power-on and afterglow phases of the pulsed plasma can be correlated with the presence of impurities desorbed from the chamber walls in the discharge volume. [ABSTRACT FROM AUTHOR]- Published
- 2014
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