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Whereas noble metal films deposited directly onto an undulated photosensitive polymer exhibit plasmon-mediated resonant transmission of free-space waves accompanied by excess losses of approximately 40 %, adequate hard baking of the photosensitive polymer, together with pre- and post-deposition of nanometer-thick ZnS or MgF dielectric interfacial layers, restores excellent propagation conditions for the long-range plasmon mode, reducing resonant transmission excess losses to 10 %, and creating the conditions for the experimental evidence of the long-sought plasmonic anomalous reflection phenomenon. [ABSTRACT FROM AUTHOR]

Whereas resonant transverse magnetic transmission across an undulated continuous metal film is achieved with the mediation of plasmon modes excited by the undulation, it is shown here that transverse electric (TE) resonant transmission through a continuous metal film can also be achieved with the mediation of the second-order TE mode of a dielectric slab waveguide having the metal film sandwiched at its middle. The demonstration is made by using the materials currently used in the domain of optical security and counterfeit deterrence: ZnS is shown to possibly be a lossless interface/adhesion layer between a polymer and a noble metal for plasmonic resonant elements. [ABSTRACT FROM AUTHOR]