1. Investigation of the impact of optical glass composition on ceria slurry stability during chemical mechanical polishing process.
- Author
-
Abbas, Farouq, Belkhir, Nabil, Herrmann, Andreas, and Rädlein, Edda
- Subjects
- *
MECHANICAL abrasion , *FUSED silica , *OPTICAL glass , *BOROSILICATES , *PARTICLE size distribution , *SLURRY - Abstract
In Chemical Mechanical Polishing (CMP) using ceria-based abrasives, a key challenge is maintaining particle stability to ensure consistent, reproducible, and predictable polishing results. Given the combined nature of CMP, involving both chemical reactions and mechanical abrasion, it is widely believed that during the polishing process, chemical compounds from the glass dissolve into the slurry, leading to changes in its chemical composition, which can affect stability and particle size distribution. However, these assumptions have primarily been based on simulations or speculative suggestions rather than direct experimental evidence. To investigate this further, experiments were conducted using three types of glass representing high, medium, and zero alkali content polished with both 400 nm and 80 nm ceria abrasives. A substantial increase in the slurry pH was observed when polishing soda-lime-silicate and borosilicate glass with 400 nm abrasives, whereas the pH remained stable when polishing fused silica glass. Notably, polishing with 80 nm abrasives did not affect the pH levels across the different glass types. Zeta potential measurements, particle size distribution, and real-time imaging provided insights into ceria particle aggregation and dispersion. Scanning Electron Microscopy (SEM) further confirmed changes in particle behavior. The findings of this study demonstrate that the polishing of alkali-containing glasses using larger ceria abrasives alters slurry chemistry and modifies particle size distribution. These findings provide new insights into the complex interactions between slurry chemistry, particle size, and glass composition in CMP, highlighting the need for careful control of abrasive properties during the process to ensure consistent and stable polishing performance. [Display omitted] • Alkaline elements in soda lime and borosilicate glass increased the slurry pH during the polishing process. • The nano-sized ceria slurry maintained its initial properties throughout the polishing of all glasses. • pH changes during polishing influenced the zeta potential and particle size distribution of ceria abrasives. • The highly aggregated particles, as indicated by our measurements, precipitate completely after a shorter time. [ABSTRACT FROM AUTHOR]
- Published
- 2024
- Full Text
- View/download PDF