24 results on '"Xu, Dongbo"'
Search Results
2. OPC and modeling solution towards 0.55NA EUV stitching
3. Improving OPC model accuracy of dry resist for low k1 EUV patterning
4. EUV single patterning of random logic via using bright field mask
5. Feasibility of logic metal scaling with 0.55NA EUV single patterning
6. EUV single patterning validation of curvilinear routing
7. Investigation of low-n mask in 0.33 NA EUV single patterning at pitch 28nm metal design
8. EUV low-n attenuated phase-shift mask on random logic via single patterning at pitch 36nm
9. Design and mask optimization toward low dose EUV exposure
10. Exploration of alternative mask for 0.33NA EUV single patterning at pitch 28nm
11. EUV single patterning exploration for pitch 28 nm
12. NXE:3400 OPC process monitoring: model validity vs process variability
13. EUV single patterning of random logic via using bright field mask.
14. Feasibility of logic metal scaling with 0.55NA EUV single patterning.
15. EUV single patterning validation of curvilinear routing.
16. EUV low-n attenuated phase-shift mask on random logic via single patterning at pitch 36nm.
17. Design and mask optimization toward low dose EUV exposure.
18. Investigation of low-n mask in 0.33 NA EUV single patterning at pitch 28nm metal design.
19. Application of Principal Component Analysis to EUV multilayer defect printing
20. Exploration of alternative mask for 0.33NA EUV single patterning at pitch 28nm.
21. EUV single patterning exploration for pitch 28 nm.
22. NXE:3400 OPC process monitoring: model validity vs process variability.
23. Defect parameters retrieval based on optical projection images
24. Reducing EUV mask 3D effects by alternative metal absorbers
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