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Being one-atom thick and tunable simultaneously, graphene plays the revolutionizing role in many areas. The focus of this paper is to investigate the modal characteristics of surface waves in structures with graphene in the far-infrared (far-IR) region. We discuss the effects exerted by substrate permittivity on propagation and localization characteristics of surface-plasmon-polaritons (SPPs) in single-layer graphene and theoretically investigate characteristics of the hybridized surface-phonon-plasmon-polaritons (SPPPs) in graphene/LiF/glass heterostructures. First, it is shown how high permittivity of substrate may improve characteristics of graphene SPPs. Next, the possibility of optimization for surface-phonon-polaritons (SPhPs) in waveguides based on LiF, a polar dielectric with a wide polaritonic gap (Reststrahlen band) and a wide range of permittivity variation, is demonstrated. Combining graphene and LiF in one heterostructure allows to keep the advantages of both, yielding tunable hybridized SPPPs which can be either forwardly or backwardly propagating. Owing to high permittivity of LiF below the gap, an almost 3.2-fold enhancement in the figure of merit (FoM), ratio of normalized propagation length to localization length of the modes, can be obtained for SPPPs at 5-9 THz, as compared with SPPs of graphene on conventional glass substrate. The enhancement is efficiently tunable by varying the chemical potential of graphene. SPPPs with characteristics which strongly differ inside and around the polaritonic gap are found. ispartof: Scientific Reports vol:8 issue:1 ispartof: location:England status: published

In this paper, we propose a facile route to fabricate a metal insulator multilayer stack to obtain ultra-broadband, wide angle behavior from the structure. The absorber, which covers near infrared (NIR) and visible (Vis) ranges, consists of a metal-insulator-metal-insulator (MIMI) multilayer where the middle metal layer has a variant thickness. It is found that this non-uniform thickness of the metal provides us with an absorption that is much broader compared to planar architecture. In the non-uniform case, each thickness is responsible for a specific wavelength range where the overall absorption is the superposition of these resonant responses and consequently a broad, perfect light absorption is attained. We first numerically examine the impact of different geometries on the overall light absorption property of the multilayer design. Afterward, we fabricate the designs and characterize them to experimentally verify our numerical findings. Characterizations show a good agreement with numerical results where the optimum absorption bandwidth for planar design is found to be 620 nm (380 nm–1000 nm) and it is significantly boosted to an amount of 1060 nm (350 nm–1410 nm) for multi-thickness case.

We report ultra-broadband perfect absorbers for visible and near-infrared applications that are based on multilayers of metal-insulator (MI) stacks fabricated employing straightforward layer deposition techniques and are, therefore, lithography-free and large-scale compatible. We scrutinize the impact of different physical parameters of an MIMI absorber structure with analysis of each contributing metal layer. After obtaining the optimal design parameters (i.e. material selection and their thicknesses) with both simulation and numerical analysis (Transfer Matrix Method) methods, an experimental sample is fabricated and characterized. Our fabricated MIMI absorber consists of an optically thick tungsten (W) back reflector layer followed by 80 nm aluminum oxide (Al2O3), 10 nm titanium (Ti), and finally another 80 nm Al2O3. The experimental results demonstrate over 90 percent absorption between 400 nm and 1640 nm wavelengths that is optimized for ultra-broadband absorption in MIMI structures. Moreover, the impedance matching method with free-space is used to shed light on the metallic layer selection process.

In this paper, we demonstrate a facile, lithography free, and large scale compatible fabrication route to synthesize an ultra-broadband wide angle perfect absorber based on metal-insulator-metal-insulator (MIMI) stack design. We first conduct a simulation and theoretical modeling approach to study the impact of different geometries in overall stack absorption. Then, a Pt-Al2O3 multilayer is fabricated using a single atomic layer deposition (ALD) step that offers high repeatability and simplicity in the fabrication step. In the best case, we get an absorption bandwidth (BW) of 600 nm covering a range of 400 nm–1000 nm. A substantial improvement in the absorption BW is attained by incorporating a plasmonic design into the middle Pt layer. Our characterization results demonstrate that the best configuration can have absorption over 0.9 covering a wavelength span of 400 nm–1490 nm with a BW that is 1.8 times broader compared to that of planar design. On the other side, the proposed structure retains its absorption high at angles as wide as 70°. The results presented here can serve as a beacon for future performance enhanced multilayer designs where a simple fabrication step can boost the overall device response without changing its overall thickness and fabrication simplicity.