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Abstract Soluble nitrogen is highly mobile in soil and susceptible to leaching. It is important to identify nitrogen transport pathways so that the sources can be efficiently targeted in environment management. This study quantified the contribution of direct runoff and baseflow to nitrate + nitrite loading by separating flow and nitrate + nitrite concentration measurements into two periods depending on whether only baseflow was present or not using baseflow separation methods. When both direct runoff and baseflow were present in streamflow, their nitrate + nitrite concentrations were assumed based on the hydrological reasoning that baseflow does not change rapidly, and streamflow mostly consists of direct runoff within a rainfall event. For this study, we obtained and investigated daily flow and nitrate + nitrite concentration observations made at the outlets of 22 watersheds located in the Western Lake Erie area. Results showed that baseflow was responsible for 26 to 77% of the nitrate + nitrite loads. The relative nitrate + nitrite load contributions of direct runoff and baseflow substantially varied with the sizes of drainage areas and agricultural land uses. Increases in drainage areas tend to prolong the travel time of surface runoff and thus help its reinfiltration into soil, which then could increase the baseflow contribution. In addition, the artificial drainage networks common in the agricultural fields of the study areas would promote the drainage of nutrient-laden excess water from soils. Such findings suggest the need for environmental management customized considering nitrogen transport pathways.

Ultrahigh density well-registered oxide nanocapacitors are very essential for large scale integrated microelectronic devices. We report the fabrication of well-ordered multiferroic BiFeO3 nanocapacitor arrays by a combination of pulsed laser deposition (PLD) method and anodic aluminum oxide (AAO) template method. The capacitor cells consist of BiFeO3/SrRuO3 (BFO/SRO) heterostructural nanodots on conductive Nb-doped SrTiO3 (Nb-STO) substrates with a lateral size of ~60 nm. These capacitors also show reversible polarization domain structures, and well-established piezoresponse hysteresis loops. Moreover, apparent current-rectification and resistive switching behaviors were identified in these nanocapacitor cells using conductive-AFM technique, which are attributed to the polarization modulated p-n junctions. These make it possible to utilize these nanocapacitors in high-density (>100 Gbit/inch2) nonvolatile memories and other oxide nanoelectronic devices. [ABSTRACT FROM AUTHOR]

Ultrahigh density well-registered oxide nanocapacitors are very essential for large scale integrated microelectronic devices. We report the fabrication of well-ordered multiferroic BiFeO3 nanocapacitor arrays by a combination of pulsed laser deposition (PLD) method and anodic aluminum oxide (AAO) template method. The capacitor cells consist of BiFeO3/SrRuO3 (BFO/SRO) heterostructural nanodots on conductive Nb-doped SrTiO3 (Nb-STO) substrates with a lateral size of ~60 nm. These capacitors also show reversible polarization domain structures, and well-established piezoresponse hysteresis loops. Moreover, apparent current-rectification and resistive switching behaviors were identified in these nanocapacitor cells using conductive-AFM technique, which are attributed to the polarization modulated p-n junctions. These make it possible to utilize these nanocapacitors in high-density (>100 Gbit/inch(2)) nonvolatile memories and other oxide nanoelectronic devices.