1. Pressure sensitivity of piezoresistive nickel–carbon Ni:a-C:H thin films
- Author
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Uhlig, Steffen, Schmid-Engel, Hanna, Speicher, Tobias, and Schultes, Günter
- Subjects
- *
PIEZORESISTIVE effect , *THIN films , *NICKEL , *CARBON , *HYDROSTATIC pressure , *STRAINS & stresses (Mechanics) , *TEMPERATURE coefficient of electric resistance , *SUBSTRATES (Materials science) - Abstract
Abstract: The piezoresistive effects of nickel–carbon thin films, i.e., the sensitivity to hydrostatic pressure and uniform strain, are investigated in this study. Thin films, which were obtained by reactive sputtering processes with thicknesses up to 1200nm, exhibit pressure sensitivity coefficients (PCR) about −20ppm/bar and gauge factors up to 30 on Si/SiO2 substrates. A linear change of the thin film''s resistance in respect to the applied hydrostatic pressure was observed. Additionally, the temperature coefficients of resistance were determined in the range of −300 to 0ppm/K, while the temperature coefficient of the PCRs was obtained as good as 0ppm/K. [Copyright &y& Elsevier]
- Published
- 2013
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