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Start Over Author "Cecchetto L" Journal solar energy materials and solar cells
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2. Highly textured multi-crystalline silicon surface obtained by dry etching multi-step process

Author

Massimo Izzi, L. Cecchetto, Garima Agarwal, Mario Tucci, Luca Serenelli, E. Salza, Tucci, M., Salza, E., Izzi, M., Serenelli, L., and Cecchetto, L.

Subjects
Reflectance, Dry etching, Multi-crystalline silicon, Texture, Materials science, Silicon, Renewable Energy, Sustainability and the Environment, business.industry, chemistry.chemical_element, Isotropic etching, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Optics, chemistry, Etching (microfabrication), Optoelectronics, Wafer, Texture (crystalline), Crystalline silicon, Reactive-ion etching, business
Abstract

In this work we propose the use of a plasma dry etching technique to condition the morphology of a silicon surface. The low environmental impacted NF3 halogen compound is adopted together with Ar to perform a multi-step process which helps to enhance the silicon surface texturing, thus reducing the time needed for the whole dry etching procedure, which also include saw damage removal on silicon wafers. A detailed study of surface reflectance and etching rate as a function of the dry plasma process parameters is discussed to achieve suitable multi-crystalline silicon surfaces for photovoltaic applications. © 2013 Elsevier B.V.

Published
2013

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