Focuses on some of the reticle enhancement technologies presented at the 20th annual BACUS Symposium on Photomask Technology which was held in September 2000 in Monterey, California. Information on Samsung Electronics' application of KrF lithography; Topic of the papers presented at the event; Details on the ArF lithography of Hyundai Electronics Industries. INSET: A new strong-PSM paradigm: Phase Phirst!.
*CONFERENCES & conventions, *SOLID state electronics
Abstract
Information on the Institute of Electrical & Electronics Engineers Inc. (IEEE) International Solid-State Circuits Conference (ISSCC) 2010 held on February 7-11, 2010 in San Franscisco, California is presented. The conference centered on three-dimensional (3D) integration technologies such as system-in-package, through-silicon via (TSV) and contactless chip-to-chip communication. In addition, Intel Corp. also presented papers on 32 nanometers "Westmere" processors.
Published
2010
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