35 results on '"Petrov I"'
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2. TiN film growth on misoriented TiN grains with simultaneous low-energy bombardment: Restructuring leading to epitaxy
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3. Recent developments in surface science and engineering, thin films, nanoscience, biomaterials, plasma science, and vacuum technology
4. Control of the metal/gas ion ratio incident at the substrate plane during high-power impulse magnetron sputtering of transition metals in Ar
5. The dynamics of TiNx (x = 1–3) admolecule interlayer and intralayer transport on TiN/TiN(001) islands
6. Ti and N adatom descent pathways to the terrace from atop two-dimensional TiN/TiN(001) islands
7. Strain-free, single-phase metastable Ti0.38Al0.62N alloys with high hardness: metal-ion energy vs. momentum effects during film growth by hybrid high-power pulsed/dc magnetron cosputtering
8. Epitaxial growth of CoSi2 on Si(001) by reactive deposition epitaxy: Island growth and coalescence
9. Orientation-dependent mobilities from analyses of two-dimensional TiN(111) island decay kinetics
10. Influence of the bias voltage on the structure and the tribological performance of nanoscale multilayer C/Cr PVD coatings
11. Self-organized lamellar structured tantalum–nitride by UHV unbalanced-magnetron sputtering
12. Structure and tribological behaviour of nanoscale multilayer C/Cr coatings deposited by the combined steered cathodic arc/unbalanced magnetron sputtering technique
13. Optical properties of nanophase films measured by variable-angle spectroscopic ellipsometry
14. Phase composition and microstructure of polycrystalline and epitaxial TaN x layers grown on oxidized Si(001) and MgO(001) by reactive magnetron sputter deposition
15. TiN(001) and TiN(111) island coarsening kinetics: in-situ scanning tunneling microscopy studies
16. Interfacial reaction pathways and kinetics during annealing of epitaxial Al/TiN(001) model diffusion barrier systems
17. In situ high-temperature scanning tunneling microscopy study of bilayer graphene growth on 6H-SiC(0001)
18. Fully strained low-temperature epitaxy of TiN/MgO(001) layers using high-flux, low-energy ion irradiation during reactive magnetron sputter deposition
19. Phase composition and microstructure of polycrystalline and epitaxial TaNx layers grown on oxidized Si(001) and MgO(001) by reactive magnetron sputter deposition
20. Ion-assisted growth of Ti1−xAlxN/Ti1−yNbyN multilayers by combined cathodic-arc/magnetron-sputter deposition
21. Single-phase polycrystalline Ti1−xWxN alloys (0⩽x⩽0.7) grown by UHV reactive magnetron sputtering: microstructure and physical properties
22. Crystal growth and microstructure of polycrystalline Ti1−xAlxN alloy films deposited by ultra-high-vacuum dual-target magnetron sputtering
23. Interfacial reactions in single-crystal-TiN (100)/Al/polycrystalline-TiN multilayer thin films
24. Transmission electron microscopy studies of microstructural evolution, defect structure, and phase transitions in polycrystalline and epitaxial Ti1−xAlxN and TiN films grown by reactive magnetron sputter deposition
25. Deposition of carbon films by bias magnetron sputtering in neon and argon
26. Effects of an unbalanced magnetron in a unique dual-cathode, high rate reactive sputtering system
27. Ion-assisted growth of Ti~1~-~x Al~xN/Ti~1~-~yNb~yN multilayers by combined cathodic-arc/magnetron-sputter deposition
28. Effect of ion bombardment during growth on the electrical resistivity of magnetron-sputtered carbon films
29. Microstructure modification of TiN by ion bombardment during reactive sputter deposition
30. The mechanism of d.c. reactive sputtering
31. Highly oriented ZnO films obtained by d.c. reactive sputtering of a zinc target
32. Direct current reactive sputtering of aluminium
33. Ion-assisted growth of Ti 1− xAl xN/Ti 1− yNb yN multilayers by combined cathodic-arc/magnetron-sputter deposition
34. Transmission electron microscopy studies of microstructural evolution, defect structure, and phase transitions in polycrystalline and epitaxial Ti 1− xAl xN and TiN films grown by reactive magnetron sputter deposition
35. Crystal growth and microstructure of polycrystalline Ti 1− xAl xN alloy films deposited by ultra-high-vacuum dual-target magnetron sputtering
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